Tape-out based on SMIC’s N+1 technology succeeds despite sanctions
N+1, SMIC’s next-generation foundry node, offers a conspicuous improvement in performance and logic density. Compared with its existing 14-nanometer (nm) process, N+1 manufacturing technology can increase a chip’s performance by 20 percent and cut its power consumption by 57 percent, said Liang Mengsong, co-CEO of SMIC.
Xiang Ligang, director-general of telecom industry association Information Consumption Alliance, told the Global Times that the successful tape-out indicates the reliability of the advanced technology. The N+1 process can basically be realized at the 8-nm level, while N+2 equals the 7-nm level.
“Issues around technology can be solved step by step, and our current technology can basically meet our demand,” Xiang said.
By Zhang Hongpei Source: Global Times Published: 2020/10/12 19:43:40
2021
半导体大国地基是空的?科技战露馅
林修民说:“他之前用给钱,看起来给钱也解决不了问题。他给了一堆钱只是多了一堆骗子出来要跟你骗钱而已,之前武汉弘芯就是最典型的例子,看到国家说要要给钱,就一堆人去争取,找了蒋爸、蒋尚义去那边。现在中国官方遇到问题是就算要给钱,也不知道要给谁,干脆就用免税。但是这个效益不会很大,尤其是他现在所遇到的问题,包括华为、中芯、紫光,都不是减税可以解决的。”
林修民认为,回过头来,半导体最重要是基础研究要扎实,包括化工、物理、电机、电路等设计、演算,要花很多人力时间投入关键技术的研发,一旦科技战开打,比的是真枪实弹,中国大陆看起来像是大楼盖很高很漂亮的资讯王国、半导体大国,其实底下地基是空的。
林修民说:“中国人的特性可能就是比较喜欢那种速成,或者是做一些表面,赚钱的方法会比较快。中国现在主要的问题是他底下地基是空的,就是他那些基础研究,没有办法支撑他上层这些半导体的应用。欧美就不要比,比亚洲就好,你看日本有多少物理奖、化学,那些才是真正蹲马步的工夫,但是中国有多少物理奖、化学奖得主?”
https://news.creaders.net/china/2020/12/18/2300922.html
芯片制造离不开光刻机,日媒曝出中国联合日本科技巨头共同研发光刻机的消息,引发外界高度关注。分析指,这将为遭美国断供的华为带来转机。
据《日本经济新闻》网站当地时间10月15日报道,业内人士透露,为了推进极紫外线以外的EUA光刻设备的研发进程,中国企业已经打算提供资金,联合尼康(Nikon)、佳能(Canon)这两家日本巨头共同研发光刻机。
https://twitter.com/TibetWest/status/1317151924794331136
另据光刻机龙头企业阿斯麦(ASML)总裁兼首席执行官(CEO)Peter Wennink称,“根据当前法规,ASML无需获得美国出口许可证便可以继续从荷兰向中国客户出货DUV光刻系统;对于直接从美国发货系统或零件到受法规影响的客户,ASML需获得许可证。”
外界分析亦认为,随着时间的推移,华为还在迎来转机。
中芯国际,官宣完成了FinFET N+1先进工艺的芯片流片和测试,所有IP全部是自主国产,而且功能一次测试通过!该代工工艺非常接近7nm制程,并且最重要的是,实现该工艺不需要用到,ASML公司生产的极紫外光刻机
这意味着,美国卡着ASML公司,不卖给中芯国际7nm极紫外光刻机的问题,被突破了,即便没有了这台光刻机,中芯国际,也能够实现7nm芯片的生产。中芯的工艺技术获得突破,不仅能够给麒麟芯片带来机会,也是国产半导体的转机
Tape-out based on SMIC’s N+1 technology succeeds despite sanctions
N+1, SMIC’s next-generation foundry node, offers a conspicuous improvement in performance and logic density. Compared with its existing 14-nanometer (nm) process, N+1 manufacturing technology can increase a chip’s performance by 20 percent and cut its power consumption by 57 percent, said Liang Mengsong, co-CEO of SMIC.
Xiang Ligang, director-general of telecom industry association Information Consumption Alliance, told the Global Times that the successful tape-out indicates the reliability of the advanced technology. The N+1 process can basically be realized at the 8-nm level, while N+2 equals the 7-nm level.
“Issues around technology can be solved step by step, and our current technology can basically meet our demand,” Xiang said.
By Zhang Hongpei Source: Global Times Published: 2020/10/12 19:43:40
https://www.globaltimes.cn/content/1203235.shtml
刘鹤敦促国企3年改革攻坚核心技术
2030